Invention Grant
US08169027B2 Substrate band gap engineered multi-gate pMOS devices 有权
基板带隙工程多栅极pMOS器件

Substrate band gap engineered multi-gate pMOS devices
Abstract:
A multi-gate transistor and a method of forming a multi-gate transistor, the multi-gate transistor including a fin having an upper portion and a lower portion. The upper portion having a first band gap and the lower portion having a second band gap with the first band gap and the second band gap designed to inhibit current flow from the upper portion to the lower portion. The multi-gate transistor further including a gate structure having sidewalls electrically coupled with said upper portion and said lower portion and a substrate positioned below the fin.
Public/Granted literature
Information query
Patent Agency Ranking
0/0