Invention Grant
US08168986B2 GaN-based semiconductor light-emitting element, light-emitting element assembly, light-emitting apparatus, method of driving GaN-based semiconductor light-emitting element, and image display apparatus 有权
GaN系半导体发光元件,发光元件组件,发光装置,GaN系半导体发光元件的驱动方法以及图像显示装置

  • Patent Title: GaN-based semiconductor light-emitting element, light-emitting element assembly, light-emitting apparatus, method of driving GaN-based semiconductor light-emitting element, and image display apparatus
  • Patent Title (中): GaN系半导体发光元件,发光元件组件,发光装置,GaN系半导体发光元件的驱动方法以及图像显示装置
  • Application No.: US12408106
    Application Date: 2009-03-20
  • Publication No.: US08168986B2
    Publication Date: 2012-05-01
  • Inventor: Ippei NishinakaGoshi BiwaHiroki Naito
  • Applicant: Ippei NishinakaGoshi BiwaHiroki Naito
  • Applicant Address: JP Tokyo
  • Assignee: Sony Corporation
  • Current Assignee: Sony Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: K&L Gates LLP
  • Priority: JP2008-104405 20080414
  • Main IPC: H01L33/00
  • IPC: H01L33/00
GaN-based semiconductor light-emitting element, light-emitting element assembly, light-emitting apparatus, method of driving GaN-based semiconductor light-emitting element, and image display apparatus
Abstract:
A GaN-based semiconductor light-emitting element is provided and includes a first GaN-based compound semiconductor layer; an active layer having a multi-quantum well structure; and a second GaN-based compound semiconductor layer. At least one of barrier layers constituting the active layer is composed of a varying-composition barrier layer, and the composition of the varying-composition barrier layer varies in the thickness direction thereof so that the band-gap energy in a region of the varying-composition barrier layer, the region being adjacent to a boundary between a well layer disposed closer to the second GaN-based compound semiconductor layer and the varying-composition barrier layer, is lower than that in a region of the varying-composition barrier layer, the region being adjacent to a boundary between a well layer disposed closer to the first GaN-based compound semiconductor layer and the varying-composition barrier layer.
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