Invention Grant
US08168979B2 Crystallization method, thin film transistor manufacturing method, thin film transistor, display, and semiconductor device
失效
结晶方法,薄膜晶体管制造方法,薄膜晶体管,显示器和半导体器件
- Patent Title: Crystallization method, thin film transistor manufacturing method, thin film transistor, display, and semiconductor device
- Patent Title (中): 结晶方法,薄膜晶体管制造方法,薄膜晶体管,显示器和半导体器件
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Application No.: US12467852Application Date: 2009-05-18
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Publication No.: US08168979B2Publication Date: 2012-05-01
- Inventor: Tomoya Kato , Masakiyo Matsumura
- Applicant: Tomoya Kato , Masakiyo Matsumura
- Applicant Address: JP Yokohama-shi
- Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-074384 20060317
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/76 ; H01L31/036 ; H01L31/112

Abstract:
According to a crystallization method, in the crystallization by irradiating a non-single semiconductor thin film of 40 to 100 nm provided on an insulation substrate with a laser light, a light intensity distribution having an inverse peak pattern is formed on the surface of the substrate, a light intensity gradient of the light intensity distribution is controlled, a crystal grain array is formed in which each crystal grain is aligned having a longer shape in a crystal growth direction than in a width direction and having a preferential crystal orientation (100) in a grain length direction, and a TFT is formed in which a source region and a drain region are formed so that current flows across a plurality of crystal grains of the crystal grain array in the crystal growth direction.
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