Invention Grant
- Patent Title: Method for the production of a sample for electron microscopy
- Patent Title (中): 生产电子显微镜样品的方法
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Application No.: US12529849Application Date: 2008-03-03
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Publication No.: US08168960B2Publication Date: 2012-05-01
- Inventor: Wolfgang Grünewald , Alex Vogt , Alexander Gabathuler
- Applicant: Wolfgang Grünewald , Alex Vogt , Alexander Gabathuler
- Applicant Address: AT Vienna
- Assignee: LEICA MIKROSYSTEME GmbH
- Current Assignee: LEICA MIKROSYSTEME GmbH
- Current Assignee Address: AT Vienna
- Agency: Foley & Lardner LLP
- Priority: CH358/07 20070306
- International Application: PCT/CH2008/000085 WO 20080303
- International Announcement: WO2008/106815 WO 20080912
- Main IPC: G21K5/10
- IPC: G21K5/10

Abstract:
A probe (1) for electron microscopy is cut from a solid material. A sample surface (3) is configured on the same, which is treated with an ion beam (J) at a predetermined angle of incidence such that the material is ablated from the sample surface (3) by means of etching until the desired observation surface (20) is exposed on the sample (1) in the region of the incidence zone (4) of the ion beam (J), which enables the viewing (12) of the desired region of the sample (1) using an electron microscope. For this purpose, at least two stationary ion beams (J1, J2) are guided onto the sample surface (3) at a predetermined angle (α) in alignment with each other such that the ion beams (J1, J2) at least come in contact with each other on the sample surface (3), or cross each other, and form an incidence zone (4) in that location, and that both the sample (1) and the ion beams (J1, J2) are not moved, and thus are operated in a stationary manner.
Public/Granted literature
- US20100025577A1 METHOD FOR THE PRODUCTION OF A SAMPLE FOR ELECTRON MICROSCOPY Public/Granted day:2010-02-04
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