Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US12410174Application Date: 2009-03-24
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Publication No.: US08168951B2Publication Date: 2012-05-01
- Inventor: Takeshi Kawasaki , Tomonori Nakano
- Applicant: Takeshi Kawasaki , Tomonori Nakano
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2005-028372 20050204
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
A charged particle beam apparatus having an aberration correction capability at high acceleration voltages. The charged particle beam apparatus comprises a charged particle beam source; an extraction electrode to extract charged particles from the charged particle beam source; a charged particle beam gun including a means for converging a charged particle beam; an acceleration means for accelerating a charged particle beam emitted from the charged particle beam gun; and an aberration correction means disposed between the charged particle beam gun and the acceleration means, in which an aberration enough to cancel out an aberration of a charged particle beam on the specimen surface is provided to an extraction electrical potential or an equivalent beam at the initial acceleration stage.
Public/Granted literature
- US20090184243A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2009-07-23
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