Invention Grant
- Patent Title: Enhanced piercing through current profiling
- Patent Title (中): 增强穿透目前的剖析
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Application No.: US12180960Application Date: 2008-07-28
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Publication No.: US08168916B2Publication Date: 2012-05-01
- Inventor: Nakhleh Hussary , Thierry Renault , Christopher Conway
- Applicant: Nakhleh Hussary , Thierry Renault , Christopher Conway
- Applicant Address: US NH West Lebanon
- Assignee: Thermal Dynamics Corporation
- Current Assignee: Thermal Dynamics Corporation
- Current Assignee Address: US NH West Lebanon
- Agency: Brinks Hofer Gilson & Lione
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
In general, the present invention provides a method of piercing a workpiece with a plasma arc torch of the type having a plasma gas flow path for directing a plasma gas through the torch and a secondary gas flow path for directing a secondary gas through the torch. The method comprises directing a flow of shield gas along a distal end portion of the plasma arc torch to deflect metal spatter generated from the piercing, and ramping a current provided to the plasma arc torch along a profile during piercing and controlling current ramp parameters as a function of a thickness of the workpiece and an operating current level, wherein the current ramp parameters comprise a length of time, a ramp rate, a shape factor, and a modulation.
Public/Granted literature
- US20100018954A1 ENHANCED PIERCING THROUGH CURRENT PROFILING Public/Granted day:2010-01-28
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