Invention Grant
- Patent Title: Methods of fabricating electrodes and uses thereof
- Patent Title (中): 制造电极的方法及其用途
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Application No.: US12945424Application Date: 2010-11-12
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Publication No.: US08168534B2Publication Date: 2012-05-01
- Inventor: Jinyao Tang , Samuel Jonas Wind
- Applicant: Jinyao Tang , Samuel Jonas Wind
- Applicant Address: US NY New York
- Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee: The Trustees of Columbia University in the City of New York
- Current Assignee Address: US NY New York
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: H01L21/441
- IPC: H01L21/441 ; H01L51/40
Abstract:
The present invention relates to methods for fabricating nanoscale electrodes separated by a nanogap, wherein the gap size may be controlled with high precision using a self-aligning aluminum oxide mask, such that the gap width depends upon the thickness of the aluminum oxide mask. The invention also provides methods for using the nanoscale electrodes.
Public/Granted literature
- US20110124188A1 METHODS OF FABRICATING ELECTRODES AND USES THEREOF Public/Granted day:2011-05-26
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