Invention Grant
- Patent Title: Method for manufacturing semiconductor substrate
- Patent Title (中): 半导体衬底的制造方法
-
Application No.: US13062057Application Date: 2010-04-27
-
Publication No.: US08168515B2Publication Date: 2012-05-01
- Inventor: Makoto Sasaki , Shin Harada , Taro Nishiguchi , Shinsuke Fujiwara , Yasuo Namikawa
- Applicant: Makoto Sasaki , Shin Harada , Taro Nishiguchi , Shinsuke Fujiwara , Yasuo Namikawa
- Applicant Address: JP Osaka-shi, Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka-shi, Osaka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2009-114737 20090511; JP2009-219065 20090924; JP2009-229764 20091001; JP2009-248621 20091029
- International Application: PCT/JP2010/057441 WO 20100427
- International Announcement: WO2010/131569 WO 20101118
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A first silicon carbide substrate having a first back-side surface and a second silicon carbide substrate having a second back-side surface are prepared. The first and second silicon carbide substrates are placed so as to expose each of the first and second back-side surfaces in one direction. A connecting portion is formed to connect the first and second back-side surfaces to each other. The step of forming the connecting portion includes a step of forming a growth layer made of silicon carbide on each of the first and second back-side surfaces, using a sublimation method of supplying a sublimate thereto in the one direction.
Public/Granted literature
- US20110165764A1 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE Public/Granted day:2011-07-07
Information query
IPC分类: