Invention Grant
- Patent Title: Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates
- Patent Title (中): 基于激活的二维模板上的自组装材料的有向组装的复杂三维结构的制造
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Application No.: US11545060Application Date: 2006-10-05
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Publication No.: US08168284B2Publication Date: 2012-05-01
- Inventor: Paul Franklin Nealey , Mark Petar Stoykovich , Konstantinos C. Daoulas , Marcus Muller , Juan J. de Pablo , SangMin Park
- Applicant: Paul Franklin Nealey , Mark Petar Stoykovich , Konstantinos C. Daoulas , Marcus Muller , Juan J. de Pablo , SangMin Park
- Applicant Address: US WA Madison
- Assignee: Wisconsin Alumni Research Foundation
- Current Assignee: Wisconsin Alumni Research Foundation
- Current Assignee Address: US WA Madison
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: B32B3/24
- IPC: B32B3/24 ; B05D5/00

Abstract:
Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.
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