Invention Grant
- Patent Title: Plasma generation system and plasma generation method
- Patent Title (中): 等离子体发生系统和等离子体生成方法
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Application No.: US11992007Application Date: 2006-08-11
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Publication No.: US08168130B2Publication Date: 2012-05-01
- Inventor: Takehiko Sato , Tatsuyuki Nakatani , Tatsuo Kimura
- Applicant: Takehiko Sato , Tatsuyuki Nakatani , Tatsuo Kimura
- Applicant Address: JP Hiroshima
- Assignee: Toyo Advanced Technologies Co., Ltd.
- Current Assignee: Toyo Advanced Technologies Co., Ltd.
- Current Assignee Address: JP Hiroshima
- Priority: JP2005-269989 20050916
- International Application: PCT/JP2006/315958 WO 20060811
- International Announcement: WO2007/032172 WO 20070322
- Main IPC: B01J19/08
- IPC: B01J19/08 ; A61L9/00 ; H05H1/24

Abstract:
A method and system for surely and conveniently generating plasma in a narrow tube having a small diameter.A first electrode formed by a conductive member covered with an insulator or dielectric is inserted into a narrow tube. The narrow tube is located on a second electrode. A power supply applies an alternating voltage or pulse voltage between the first electrode and the second electrode so that plasma is generated in the narrow tube around the first electrode.
Public/Granted literature
- US20100065415A1 Plasma Generation System and Plasma Generation Method Public/Granted day:2010-03-18
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