Invention Grant
- Patent Title: Automatic constant pressure polishing apparatus for improving surface accuracy of lens
- Patent Title (中): 自动恒压抛光装置,用于提高镜头的表面精度
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Application No.: US12302747Application Date: 2007-11-14
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Publication No.: US08167682B2Publication Date: 2012-05-01
- Inventor: Geonhee Kim , Sunchoel Yang , Myengsang Kim , Kisoo Chang , Hyosik Kim
- Applicant: Geonhee Kim , Sunchoel Yang , Myengsang Kim , Kisoo Chang , Hyosik Kim
- Applicant Address: KR Deajeon
- Assignee: Korea Basic Science Institute
- Current Assignee: Korea Basic Science Institute
- Current Assignee Address: KR Deajeon
- Agency: Staas & Halsey LLP
- Priority: KR10-2006-0112910 20061115
- International Application: PCT/KR2007/005704 WO 20071114
- International Announcement: WO2008/060091 WO 20080522
- Main IPC: B24B13/00
- IPC: B24B13/00

Abstract:
Disclosed is an automatic constant pressure polishing apparatus. The automatic constant pressure polishing apparatus comprises a housing having a hollow section therein, a rubber pad installed in the housing and having superior expansion and contraction characteristics, a pressure fixture having a male screw section, which is formed on an outer peripheral surface thereof in order to press and fix the rubber pad, and a central hole formed at a central portion thereof, a slider screw-coupled into the housing to adjust pressure in the housing according to a rotational degree of the rotating shaft, and a polishing pad installed at a front end portion of the housing.
Public/Granted literature
- US20090239449A1 Automatic constant pressure polishing apparatus for improving surface accuracy of lens Public/Granted day:2009-09-24
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