Invention Grant
- Patent Title: Drying furnace for coated film
- Patent Title (中): 涂膜干燥炉
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Application No.: US11659317Application Date: 2005-08-22
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Publication No.: US08167611B2Publication Date: 2012-05-01
- Inventor: Teruyuki Nakano , Yasuhiro Kozawa
- Applicant: Teruyuki Nakano , Yasuhiro Kozawa
- Applicant Address: JP Hiroshima
- Assignee: Kabushiki Kaisha Ishiihyoki
- Current Assignee: Kabushiki Kaisha Ishiihyoki
- Current Assignee Address: JP Hiroshima
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2004-243930 20040824
- International Application: PCT/JP2005/015221 WO 20050822
- International Announcement: WO2006/022232 WO 20060302
- Main IPC: F27D3/06
- IPC: F27D3/06

Abstract:
In drying of a glass substrate to which a coated film is applied, the heating and drying is conducted while feeding means 10, 18, which always moves on a lower surface of the glass substrate 6 to which the coated film is applied, abuts against the substrate, in order to solve a problem that when the lower surface of the coated film is supported for a long time, supporting traces occur and thereby quality of the glass substrate is reduced. With this configuration, traces of the pin 11, 12, 21 are less likely to occur.
Public/Granted literature
- US20100167224A1 Drying furnace for cated film Public/Granted day:2010-07-01
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