Invention Grant
US08166633B2 Method for manufacturing an extraordinary magnetoresistive (EMR) device with novel lead structure
有权
用于制造具有新型引线结构的非凡磁阻(EMR)器件的方法
- Patent Title: Method for manufacturing an extraordinary magnetoresistive (EMR) device with novel lead structure
- Patent Title (中): 用于制造具有新型引线结构的非凡磁阻(EMR)器件的方法
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Application No.: US12972332Application Date: 2010-12-17
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Publication No.: US08166633B2Publication Date: 2012-05-01
- Inventor: Thomas Dudley Boone, Jr. , Liesl Folks , Bruce Alvin Gurney , Jordan Asher Katine , Ernesto E. Marinero , Neil Smith
- Applicant: Thomas Dudley Boone, Jr. , Liesl Folks , Bruce Alvin Gurney , Jordan Asher Katine , Ernesto E. Marinero , Neil Smith
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
A method for manufacturing an extraordinary magnetoresistive sensor (EMR sensor) having reduced size and increased resolution is described. The sensor includes a plurality of electrically conductive leads contacting a magnetically active layer and also includes an electrically conductive shunt structure. The electrically conductive leads of the sensor and the shunt structure can be formed in a common photolithographic masking and etching process so that they are self aligned with one another. This avoids the need to align multiple photolithographic processing steps, thereby allowing greatly increased resolution and reduced lead spacing. The EMR sensor can be formed with a magnetically active layer that can be close to or at the air bearing surface (ABS) for improved magnetic spacing with an adjacent magnetic medium of a data recording system.
Public/Granted literature
- US20110086440A1 METHOD FOR MANUFACTURING AN EXTRAORDINARY MAGNETORESISTIVE (EMR) DEVICE WITH NOVEL LEAD STRUCTURE Public/Granted day:2011-04-14
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