Invention Grant
- Patent Title: Position detection apparatus, exposure apparatus, and method of manufacturing device
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Application No.: US12729515Application Date: 2010-03-23
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Publication No.: US08149423B2Publication Date: 2012-04-03
- Inventor: Noritoshi Sakamoto
- Applicant: Noritoshi Sakamoto
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2009-072863 20090324
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.
Public/Granted literature
- US20100245848A1 POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2010-09-30
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