Invention Grant
US08149386B2 Illumination optical system, exposure apparatus using the same and device manufacturing method
有权
照明光学系统,使用相同的曝光装置和装置制造方法
- Patent Title: Illumination optical system, exposure apparatus using the same and device manufacturing method
- Patent Title (中): 照明光学系统,使用相同的曝光装置和装置制造方法
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Application No.: US12390315Application Date: 2009-02-20
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Publication No.: US08149386B2Publication Date: 2012-04-03
- Inventor: Kazuhiko Kajiyama
- Applicant: Kazuhiko Kajiyama
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2008-045504 20080227
- Main IPC: G03B27/70
- IPC: G03B27/70

Abstract:
An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
Public/Granted literature
- US20090213355A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS USING THE SAME AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-08-27
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