Invention Grant
- Patent Title: Surface position detection apparatus, exposure apparatus, and exposure method
- Patent Title (中): 表面位置检测装置,曝光装置和曝光方法
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Application No.: US11988239Application Date: 2006-06-28
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Publication No.: US08149382B2Publication Date: 2012-04-03
- Inventor: Yasuhiro Hidaka , Tadashi Nagayama
- Applicant: Yasuhiro Hidaka , Tadashi Nagayama
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2005-200178 20050708
- International Application: PCT/JP2006/312852 WO 20060628
- International Announcement: WO2007/007549 WO 20070118
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/72

Abstract:
A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.
Public/Granted literature
- US20100129739A1 Surface Position Detection Apparatus, Exposure Apparatus, and Exposure Method Public/Granted day:2010-05-27
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