Invention Grant
US08148219B2 Thick oxide P-gate NMOS capacitor for use in a low-pass filter of a circuit and method of making same
失效
用于电路的低通滤波器的厚氧化物P栅极NMOS电容器及其制造方法
- Patent Title: Thick oxide P-gate NMOS capacitor for use in a low-pass filter of a circuit and method of making same
- Patent Title (中): 用于电路的低通滤波器的厚氧化物P栅极NMOS电容器及其制造方法
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Application No.: US12484652Application Date: 2009-06-15
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Publication No.: US08148219B2Publication Date: 2012-04-03
- Inventor: Derek Tam , Jasmine Cheng , Jungwoo Song , Takayuki Hayashi
- Applicant: Derek Tam , Jasmine Cheng , Jungwoo Song , Takayuki Hayashi
- Applicant Address: US CA Irvine
- Assignee: Broadcom Corporation
- Current Assignee: Broadcom Corporation
- Current Assignee Address: US CA Irvine
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H01L21/338
- IPC: H01L21/338

Abstract:
A circuit with dielectric thicknesses is presented that includes a low-pass filter including one or more semiconductor devices having a thick gate oxide layer, while further semiconductor devices of the circuit have thin gate oxide layers. The low-pass filter semiconductor device includes an N-type substrate, a P-type region formed on the N-type substrate, a thick gate oxide layer formed over the P-type region, a P+ gate electrode formed over the thick gate oxide layer and coupled to a first voltage supply line, and P+ pick-up terminals formed in the P-type region adjacent the gate electrode and coupled to a second voltage supply line. The low-pass filter semiconductor device acts as a capacitor, whereby a gate-to-substrate voltage is maintained at less than zero volts to maintain a stable control voltage for the circuit.
Public/Granted literature
- US20090253240A1 Thick Oxide P-Gate NMOS Capacitor for Use In A Low-Pass Filter of a Circuit and Method of Making Same Public/Granted day:2009-10-08
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