Invention Grant
- Patent Title: Nonvolatile semiconductor memory and process of producing the same
- Patent Title (中): 非易失性半导体存储器及其制造方法
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Application No.: US12974873Application Date: 2010-12-21
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Publication No.: US08148216B2Publication Date: 2012-04-03
- Inventor: Fumitaka Arai , Riichiro Shirota
- Applicant: Fumitaka Arai , Riichiro Shirota
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-344803 20061221
- Main IPC: H01L21/71
- IPC: H01L21/71

Abstract:
A nonvolatile semiconductor memory of an aspect of the present invention comprises a semiconductor substrate, a pillar-shaped semiconductor layer extending in the vertical direction with respect to the surface of the semiconductor substrate, a plurality of memory cells arranged in the vertical direction on the side surface of the semiconductor layer and having a charge storage layer and a control gate electrode, a first select gate transistor arranged on the semiconductor layer at an end of the memory cells on the side of the semiconductor substrate, and a second select gate transistor arranged on the semiconductor layer on the other end of the memory cells opposite to the side of the semiconductor substrate, wherein the first select gate transistor includes a diffusion layer in the semiconductor substrate and is electrically connected to the pillar-shaped semiconductor layer by way of the diffusion layer that serves as the drain region.
Public/Granted literature
- US20110092033A1 NONVOLATILE SEMICONDUCTOR MEMORY AND PROCESS OF PRODUCING THE SAME Public/Granted day:2011-04-21
Information query
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