Invention Grant
- Patent Title: Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatterns
- Patent Title (中): 浸渍多曝光方法和浸没曝光系统，用于分别进行微图案和非微图案的多次曝光
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Application No.: US12140653Application Date: 2008-06-17
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Publication No.: US08148054B2Publication Date: 2012-04-03
- Inventor: Takehiro Kondoh
- Applicant: Takehiro Kondoh
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2007-160467 20070618
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a cleaning step of clearing the surface of the substrate, and a second exposure step of performing immersion exposure of the photoresist film using a second mask. No heating process is performed between the first exposure step and the second exposure step.
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