Invention Grant
- Patent Title: Substrate with a stack having thermal properties
- Patent Title (中): 具有热性能的叠层基板
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Application No.: US11579510Application Date: 2005-04-27
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Publication No.: US08147969B2Publication Date: 2012-04-03
- Inventor: Laurent LaBrousse , Eric Petitjean
- Applicant: Laurent LaBrousse , Eric Petitjean
- Applicant Address: FR Courbevoie
- Assignee: Saint-Gobain Glass France
- Current Assignee: Saint-Gobain Glass France
- Current Assignee Address: FR Courbevoie
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR0404804 20040505
- International Application: PCT/FR2005/050282 WO 20050427
- International Announcement: WO2005/110939 WO 20051124
- Main IPC: B32B9/00
- IPC: B32B9/00 ; C23C16/00

Abstract:
The invention relates to a substrate (1) provided with a thin-film multilayer comprising an alternation of n functional layers (3) having reflection properties in the infrared and/or in solar radiation, and (n+1) coatings (2, 5), where n≧1, said coatings being composed of a layer or a plurality of layers (2a, 2b, 5a, 5b), characterized in that, in order to preserve the optical and/or mechanical quality of the multilayer in the case in which the substrate (1) provided with said multilayer is subjected to a heat treatment of the toughening, bending or annealing type, at least one of the functional layers (3) includes a blocker coating (4) consisting of: on the one hand, a “protection” layer made of a material capable of helping to protect the functional layer from oxidizing and/or nitriding attack, immediately in contact with said functional layer; and on the other hand, at least one “adhesion” layer made of a material capable of promoting adhesion, immediately in contact with said “protection” layer.
Public/Granted literature
- US20070204949A1 Substrate With A Stack Having Thermal Properties Public/Granted day:2007-09-06
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