Invention Grant
- Patent Title: Method of manufacturing single crystal
- Patent Title (中): 单晶制造方法
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Application No.: US11988295Application Date: 2006-04-27
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Publication No.: US08147611B2Publication Date: 2012-04-03
- Inventor: Masahiro Sakurada , Izumi Fusegawa
- Applicant: Masahiro Sakurada , Izumi Fusegawa
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-204207 20050713
- International Application: PCT/JP2006/308814 WO 20060427
- International Announcement: WO2007/007456 WO 20070118
- Main IPC: C30B15/20
- IPC: C30B15/20

Abstract:
A method of manufacturing a single crystal based on a Czochralski method of applying a horizontal magnetic field, wherein the single crystal is pulled in such a manner that a radial magnetic field intensity gradient ΔBr/ΔRc in a direction connecting central points of magnetic field generation coils exceeds 5.5 (Gauss/mm) and becomes 10 (Gauss/mm) or below where an origin O is a central part of the single crystal on a solid-liquid interface, ΔBr (Gauss) is a variation in a magnetic field intensity from the origin O to a crucible inner wall on a surface of a melt, and ΔRc (mm) is a radial distance from the origin O to the crucible inner wall on the surface of the melt.
Public/Granted literature
- US20100126409A1 Method of Manufacturing Single Crystal Public/Granted day:2010-05-27
Information query
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