Invention Grant
- Patent Title: Method of object transfer for a heat treatment system
- Patent Title (中): 热处理系统物体转移方法
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Application No.: US12849317Application Date: 2010-08-03
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Publication No.: US08147241B2Publication Date: 2012-04-03
- Inventor: Shinya Mochizuki , Motoki Akimoto
- Applicant: Shinya Mochizuki , Motoki Akimoto
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2000-253201 20000823; JP2000-372098 20001206; JP2000-372099 20001206; JP2001-004971 20010112
- Main IPC: F27D3/00
- IPC: F27D3/00

Abstract:
Disclosed herein is method for use in a vertical heat treatment system which has an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and and through which an object to be treated is carried in the vertical heat treatment system to carry out a predetermined treatment. When the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.
Public/Granted literature
- US20100316968A1 METHOD OF OBJECT TRANSFER FOR A HEAT TREATMENT SYSTEM Public/Granted day:2010-12-16
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