Invention Grant
- Patent Title: Imprint apparatus and method for fine structure lithography
- Patent Title (中): 用于精细结构光刻的印刷装置和方法
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Application No.: US12343550Application Date: 2008-12-24
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Publication No.: US08147234B2Publication Date: 2012-04-03
- Inventor: Masahiko Ogino , Mitsuru Hasegawa , Akihiro Miyauchi
- Applicant: Masahiko Ogino , Mitsuru Hasegawa , Akihiro Miyauchi
- Applicant Address: JP Tokyo
- Assignee: Hitachi Industrial Equipment Systems Co., Ltd.
- Current Assignee: Hitachi Industrial Equipment Systems Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-335513 20071227
- Main IPC: B29C59/04
- IPC: B29C59/04

Abstract:
An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member.
Public/Granted literature
- US20090166914A1 IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY Public/Granted day:2009-07-02
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