Invention Grant
- Patent Title: High-frequency power supply system
- Patent Title (中): 高频电源系统
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Application No.: US12834579Application Date: 2010-07-12
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Publication No.: US08134816B2Publication Date: 2012-03-13
- Inventor: Hiroyuki Kotani , Hirotaki Takei , Yoshifumi Ibuki , Hiroaki Oichi
- Applicant: Hiroyuki Kotani , Hirotaki Takei , Yoshifumi Ibuki , Hiroaki Oichi
- Applicant Address: JP Osaka
- Assignee: Daihen Corporation
- Current Assignee: Daihen Corporation
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2003-396740 20031127; JP2004-086968 20040324
- Main IPC: H02H3/00
- IPC: H02H3/00

Abstract:
A high-frequency power supply system includes an anomaly detector 3 which detects an anomaly occurring in a circuit on the side of a load L as from an outputting end A of a high-frequency power source 1. The anomaly detector 3 includes a first detector 21 which detects a voltage value Vf of a high-frequency forward wave, a second detector 22 which detects a voltage value Vr of a high-frequency reflected wave, a reflection coefficient calculator 23 and a differentiator 24 which calculate a reflection coefficient differential value dΓ/dt from the forward wave voltage value Vf and the reflected wave voltage value Vr, and an anomaly determiner 25 which determines of an occurrence of an anomaly based on the reflection coefficient differential value dΓ/dt. When the anomaly detector 3 outputs an anomaly detection signal to the high-frequency power source 1, high-frequency power source 1 stops its power output operation.
Public/Granted literature
- US20100277843A1 HIGH-FREQUENCY POWER SUPPLY SYSTEM Public/Granted day:2010-11-04
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