Invention Grant
US08129706B2 Structures and methods of a bistable resistive random access memory
有权
双稳态电阻随机存取存储器的结构和方法
- Patent Title: Structures and methods of a bistable resistive random access memory
- Patent Title (中): 双稳态电阻随机存取存储器的结构和方法
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Application No.: US11381973Application Date: 2006-05-05
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Publication No.: US08129706B2Publication Date: 2012-03-06
- Inventor: ChiaHua Ho , Erh-Kun Lai , Kuang Yeu Hsieh
- Applicant: ChiaHua Ho , Erh-Kun Lai , Kuang Yeu Hsieh
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L47/00

Abstract:
Structures and methods to form a bistable resistive random access memory for reducing the amount of heat dissipation from electrodes by confining a heating region in the memory cell device are described. The heating region is confined in a kernel comprising a programmable resistive memory material that is in contact with an upper programmable resistive memory member and a lower programmable resistive memory member. The lower programmable resistive member has sides that align with sides of a bottom electrode comprising a tungsten plug. The lower programmable resistive member and the bottom electrode function a first conductor so that the amount of heat dissipation from the first conductor is reduced. The upper programmable resistive memory material and a top electrode function as a second conductor so that the amount of heat dissipation from the second conductor is reduced.
Public/Granted literature
- US20070257300A1 Structures and Methods of a Bistable Resistive Random Access Memory Public/Granted day:2007-11-08
Information query
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