Invention Grant
- Patent Title: Radiation system with contamination barrier
- Patent Title (中): 具有污染屏障的辐射系统
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Application No.: US12771466Application Date: 2010-04-30
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Publication No.: US08129702B2Publication Date: 2012-03-06
- Inventor: Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
- Applicant: Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP02080454 20021223; EP03075086 20030113
- Main IPC: G21F1/00
- IPC: G21F1/00
Abstract:
A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
Public/Granted literature
- US20100200772A1 RADIATION SYSTEM WITH CONTAMINATION BARRIER Public/Granted day:2010-08-12
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