Invention Grant
US08129698B2 Charged-particle beam writing method and charged-particle beam writing apparatus 有权
带电粒子束写入方法和带电粒子束写入装置

Charged-particle beam writing method and charged-particle beam writing apparatus
Abstract:
A pattern density distribution and a dose distribution calculated using the pattern density distribution are multiplied by each other to calculate an exposure distribution. A fogging electron amount distribution is calculated using the exposure distribution and a function descriptive of a fogging spread distribution. Charge amount distributions in irradiation and non-irradiation regions are calculated using the exposure distribution and the fogging electron amount distribution. A position displacement amount distribution is calculated using the charge amount distributions and a response function for converting a charge amount to a position displacement error.
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