Invention Grant
- Patent Title: Mask for coded aperture systems
- Patent Title (中): 编码孔径系统的掩模
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Application No.: US12122447Application Date: 2008-05-16
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Publication No.: US08129686B2Publication Date: 2012-03-06
- Inventor: Scott Stephen Zelakiewicz , Jeffrey Seymour Gordon
- Applicant: Scott Stephen Zelakiewicz , Jeffrey Seymour Gordon
- Applicant Address: US CA Newark
- Assignee: Morpho Detection, Inc.
- Current Assignee: Morpho Detection, Inc.
- Current Assignee Address: US CA Newark
- Agency: Armstrong Teasdale LLP
- Main IPC: G01T1/161
- IPC: G01T1/161

Abstract:
A coded aperture includes a position sensitive detector configured to observe the location of emitted high energy radiation, and a mask disposed in front of the position sensitive detector, wherein the mask has a non-linear shape configured to define a perimeter around position sensitive detector, wherein the mask comprises a plurality of attenuating and transparent elements of a predetermined configuration, positioned such that the emitted radiation is detected by the position sensitive detector after passage through the mask.
Public/Granted literature
- US20120025092A1 MASK FOR CODED APERTURE SYSTEMS Public/Granted day:2012-02-02
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