Invention Grant
- Patent Title: Method for producing high temperature thin film silicon layer on glass
- Patent Title (中): 在玻璃上生产高温薄膜硅层的方法
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Application No.: US13078916Application Date: 2011-04-01
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Publication No.: US08129215B1Publication Date: 2012-03-06
- Inventor: James P Campbell , Harry R Campbell , Ann B Campbell , Joel F Farber
- Applicant: James P Campbell , Harry R Campbell , Ann B Campbell , Joel F Farber
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/20
Abstract:
A method for producing a High Temperature Thin Film Layer On Glass (HTTFLOG) of silicon, which is a precursor component of thin film transistors (TFTs). The invention described here is a superior method of fabricating HTTFLOG precursor structures or components for liquid crystal displays (LCDs) with quicker production time and lower cost of manufacture while enabling a groundbreaking increase in small and large screen resolution. This invention is a new sub-assembly intended for original equipment manufacturer (OEM) consumption and inclusion in display products.
Public/Granted literature
- US1242894A Film-box for motion-picture cameras. Public/Granted day:1917-10-09
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