Invention Grant
- Patent Title: Auto feedback apparatus for laser marking
- Patent Title (中): 用于激光打标的自动反馈装置
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Application No.: US12636539Application Date: 2009-12-11
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Publication No.: US08129203B2Publication Date: 2012-03-06
- Inventor: Lan Fang Chang , Wei-Ming You
- Applicant: Lan Fang Chang , Wei-Ming You
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/66
- IPC: H01L21/66
Abstract:
A method of manufacturing integrated circuits includes measuring a reflectivity value of a wafer. An optimum energy level for laser marking the wafer is determined using the reflectivity value. A laser beam having the optimum energy level is then emitted to make laser marks on the wafer.
Public/Granted literature
- US20100240155A1 Auto Feedback Apparatus for Laser Marking Public/Granted day:2010-09-23
Information query
IPC分类:
