Invention Grant
- Patent Title: Release surfaces, particularly for use in nanoimprint lithography
- Patent Title (中): 释放表面,特别适用于纳米压印光刻
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Application No.: US11773719Application Date: 2007-07-05
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Publication No.: US08128856B2Publication Date: 2012-03-06
- Inventor: Stephen Y. Chou
- Applicant: Stephen Y. Chou
- Applicant Address: US MN Minneapolis
- Assignee: Regents of the University of Minnesota
- Current Assignee: Regents of the University of Minnesota
- Current Assignee Address: US MN Minneapolis
- Agency: Polster, Lieder, Woodruff & Lucchesi, L.C.
- Main IPC: B29C33/64
- IPC: B29C33/64

Abstract:
A method to forming a pattern on a surface of a substrate, including the steps of providing a mold having a molding surface comprised of one or more protruding features and one or more recessed features for imprinting a pattern. The pattern comprising at least one feature having a lateral dimension of about 2000 nanometer or less. Providing a monomolecular anti-adhesive layer on the mold which is either continuous or discontinuous, prior to depositing a hardenable, flowable material onto the mold and recessed features. The mold and substrate are pressed together, while the flowable material hardens and adheres to the moldable material and the substrate. Upon separation of the mold and the substrate, the hardened material remains on the substrate.
Public/Granted literature
- US20080012184A1 Release Surfaces, Particularly For Use In Nanoimprint Lithography Public/Granted day:2008-01-17
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