Invention Grant
- Patent Title: Nitride compound semiconductor element
- Patent Title (中): 氮化物半导体元件
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Application No.: US11568481Application Date: 2005-10-13
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Publication No.: US08093685B2Publication Date: 2012-01-10
- Inventor: Naomi Anzue , Toshiya Yokogawa , Yoshiaki Hasegawa
- Applicant: Naomi Anzue , Toshiya Yokogawa , Yoshiaki Hasegawa
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- Priority: JP2004-300907 20041015
- International Application: PCT/JP2005/018881 WO 20051013
- International Announcement: WO2006/041134 WO 20060420
- Main IPC: H01L29/20
- IPC: H01L29/20

Abstract:
A nitride compound semiconductor element according to the present invention is a nitride compound semiconductor element including a substrate 1 having an upper face and a lower face and a semiconductor multilayer structure 40 supported by the upper face of the substrate 1, such that the substrate 1 and the semiconductor multilayer structure 40 have at least two cleavage planes. At least one cleavage inducing member 3 which is in contact with either one of the two cleavage planes is provided, and a size of the cleavage inducing member 3 along a direction parallel to the cleavage plane is smaller than a size of the upper face of the substrate 1 along the direction parallel to the cleavage plane.
Public/Granted literature
- US20080042244A1 Nitride Compound Semiconductor Element and Production Method Therefor Public/Granted day:2008-02-21
Information query
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