Invention Grant
US08091048B2 Method for predicting resist pattern shape, computer readable medium storing program for predicting resist pattern shape, and computer for predicting resist pattern shape
有权
用于预测抗蚀剂图案形状的方法，用于预测抗蚀剂图案形状的计算机可读介质存储程序，以及用于预测抗蚀剂图案形状的计算机
- Patent Title: Method for predicting resist pattern shape, computer readable medium storing program for predicting resist pattern shape, and computer for predicting resist pattern shape
- Patent Title (中): 用于预测抗蚀剂图案形状的方法，用于预测抗蚀剂图案形状的计算机可读介质存储程序，以及用于预测抗蚀剂图案形状的计算机
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Application No.: US12037356Application Date: 2008-02-26
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Publication No.: US08091048B2Publication Date: 2012-01-03
- Inventor: Ryotaro Naka
- Applicant: Ryotaro Naka
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2007-047885 20070227
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
The contour shape of an aerial image formed on a resist by projecting a test pattern onto the resist via a projection optical system is computed. The shape of a resist pattern formed by the exposure using the test pattern and the development process is measured. A correction model indicating the relationship between the amount of characteristic of the contour shape and the amount of correction determined in accordance with the difference between the computed contour shape and the measured shape of the resist pattern is created. The contour shape of an aerial image formed on a resist by projecting an arbitrary pattern onto the resist via the projection optical system is computed. The shape of a resist pattern corresponding to the arbitrary pattern is predicted by correcting the computed contour shape of the aerial image, using the amount of correction given by the correction model in correspondence with the amount of characteristic of the contour shape.
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