Invention Grant
- Patent Title: Method and system for enhancing the yield in semiconductor manufacturing
- Patent Title (中): 提高半导体制造产量的方法和系统
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Application No.: US12208279Application Date: 2008-09-10
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Publication No.: US08090464B2Publication Date: 2012-01-03
- Inventor: Lars Bomholt , Jim Chalmers , Wolfgang Fichtner
- Applicant: Lars Bomholt , Jim Chalmers , Wolfgang Fichtner
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
Roughly described, a manufacturing process is enhanced by using TCAD and TCAD-derived models. A TCAD simulation model of the process is developed, which predicts, in dependence upon a plurality of process input parameters, a value for a performance parameter of a product to be manufactured using the process. Estimated, predicted or desired values for a calculated subset of the parameters (including either process input parameters or product performance parameters or both), are determined in dependence upon the process model, and further in dependence upon actual, estimated or desired values for a different subset of the parameters (again either process input parameters or product performance parameters or both). The determination is preferably made using a process compact model of the process, itself developed in dependence upon the simulation model.
Public/Granted literature
- US20090005894A1 METHOD AND SYSTEM FOR ENHANCING THE YIELD IN SEMICONDUCTOR MANUFACTURING Public/Granted day:2009-01-01
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