Invention Grant
- Patent Title: Exposure apparatus and method for producing device
- Patent Title (中): 曝光装置及其制造方法
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Application No.: US12382047Application Date: 2009-03-06
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Publication No.: US08089611B2Publication Date: 2012-01-03
- Inventor: Masahiro Nei , Naoyuki Kobayashi
- Applicant: Masahiro Nei , Naoyuki Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2002-357958 20021210; JP2003-296491 20030820
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
A vacuum system for an immersion exposure apparatus includes a flow passage connected to a vacuum source, and a separator provided on the flow passage. The separator separates any gas from a liquid sucked into the flow passage together with the gas.
Public/Granted literature
- US20090180089A1 Exposure apparatus and method for producing device Public/Granted day:2009-07-16
Information query
