Thin film capacitor and method of fabrication thereof

Invention Grant

US08088658B2 Thin film capacitor and method of fabrication thereof 失效

Title translation: 薄膜电容器及其制造方法

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Patent Title: Thin film capacitor and method of fabrication thereof
Patent Title (中): 薄膜电容器及其制造方法
Application No.: US12431298

Application Date: 2009-04-28
Publication No.: US08088658B2

Publication Date: 2012-01-03
Inventor: Juan Carlos Figueroa , Damien Francis Reardon
Applicant: Juan Carlos Figueroa , Damien Francis Reardon
Applicant Address: US DE Wilmington
Assignee: E. I. du Pont de Nemours and Company
Current Assignee: E. I. du Pont de Nemours and Company
Current Assignee Address: US DE Wilmington
Main IPC: H01L21/8242
IPC: H01L21/8242 ; H01L21/20

Thin film capacitor and method of fabrication thereof

Abstract:

Methods for fabricating a capacitor are provided. In the methods, a dielectric may be formed on a metal (e.g. nickel) substrate, and a copper electrode is formed thereon, followed by the thinning of the metal substrate from its non-coated face, and subsequently forming a copper electrode on the thinned, non-coated face of the substrate.

Abstract(Chinese):

提供制造电容器的方法。在这些方法中，可以在金属（例如镍）基板上形成电介质，并在其上形成铜电极，随后从其未涂覆面减薄金属基板，随后在薄的，未涂覆的基材面。

Public/Granted literature

US20100270261A1 THIN FILM CAPACITOR AND METHOD OF FABRICATION THEREOF Public/Granted day:2010-10-28

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/70	.由在一共用基片内或其上形成的多个固态组件或集成电路组成的器件或其部件的制造或处理；集成电路器件或其特殊部件的制造（由预制电组件组成的组装件的制造入H05K3/00，H05K13/00）
H01L21/77	..在公共衬底中或上面形成的由许多固态元件或集成电路组成的器件的制造或处理（电可编程只读存储器或其多步骤的制造方法入H01L27/115）
H01L21/78	...把衬底连续地分成多个独立的器件（改变表面物理特性或者半导体形状的切割入H01L21/304）
H01L21/82	....制造器件，例如每一个由许多元件组成的集成电路
H01L21/822	.....衬底是采用硅工艺的半导体的（H01L21/8258优先）
H01L21/8232	......场效应工艺
H01L21/8234	.......MIS工艺
H01L21/8239	........存储器结构
H01L21/8242	.........动态随机存取存储结构（DRAM）