Invention Grant
- Patent Title: Base soluble polymers for photoresist compositions
- Patent Title (中): 用于光致抗蚀剂组合物的基础可溶性聚合物
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Application No.: US12263511Application Date: 2008-11-03
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Publication No.: US08088564B2Publication Date: 2012-01-03
- Inventor: David Abdallah , Francis Houlihan
- Applicant: David Abdallah , Francis Houlihan
- Applicant Address: US NJ Somerville
- Assignee: AZ Electronic Materials USA Corp.
- Current Assignee: AZ Electronic Materials USA Corp.
- Current Assignee Address: US NJ Somerville
- Agent Alan P. Kass; Sangya Jain
- Main IPC: G03F7/40
- IPC: G03F7/40 ; G03F7/039 ; C08G75/20
Abstract:
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
Public/Granted literature
- US20090061347A1 BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS Public/Granted day:2009-03-05
Information query
IPC分类:
