Invention Grant
US08088465B2 Optical storage medium with a mask layer providing a super resolution near field effect, and respective manufacturing method 有权
具有提供超分辨率近场效应的掩模层的光存储介质及其制造方法

  • Patent Title: Optical storage medium with a mask layer providing a super resolution near field effect, and respective manufacturing method
  • Patent Title (中): 具有提供超分辨率近场效应的掩模层的光存储介质及其制造方法
  • Application No.: US12448955
    Application Date: 2008-01-21
  • Publication No.: US08088465B2
    Publication Date: 2012-01-03
  • Inventor: Joachim Knittel
  • Applicant: Joachim Knittel
  • Applicant Address: FR Boulogne, Billancourt
  • Assignee: Thomson Licensing
  • Current Assignee: Thomson Licensing
  • Current Assignee Address: FR Boulogne, Billancourt
  • Agent Jeffrey D. Carter
  • Priority: EP07100977 20070123
  • International Application: PCT/EP2008/050602 WO 20080121
  • International Announcement: WO2008/090104 WO 20080731
  • Main IPC: B32B3/02
  • IPC: B32B3/02
Optical storage medium with a mask layer providing a super resolution near field effect, and respective manufacturing method
Abstract:
The optical storage medium, in particular a read-only optical disc, comprises a substrate layer, a read only data layer comprising a pit structure and being arranged on the substrate layer, a mask layer comprising nanoparticles for providing a super resolution near field effect, and a dielectric layer arranged between the data layer and the mask layer. The dielectric layer has a thickness, which changes in dependency of the pit structure and is for example a plastic layer having a completely flat surface for providing a uniform arrangement of the nanoparticles. For the manufacturing of a respective optical storage medium, the dielectric layer is arranged on the data layer advantageously by means of spin coating.
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