A method, system and computer program product for filtering systematic differences from wafer evaluation parameters provides an efficient visual display and numerical map technique for observing wafer-level process variation. Measurement data is gathered from electronic circuits at multiple positions within multiple regions on one or more wafers and parameters are computed from the measurement data, which may be the measurement data values themselves. The set of parameters is filtered for expected systematic variation by computing a set of normalization values from the set of parameters and normalizing the data according to the normalization values. The normalized parameter set is then either presented in a visual display, e.g., by color mapping, or arranged in a numerical map of parameter value by location.