Invention Grant
US07990760B2 Semiconductor SRAM with alternatively arranged P-well and N-well regions
失效
半导体SRAM具有交替布置的P阱和N阱区域
- Patent Title: Semiconductor SRAM with alternatively arranged P-well and N-well regions
- Patent Title (中): 半导体SRAM具有交替布置的P阱和N阱区域
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Application No.: US12134750Application Date: 2008-06-06
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Publication No.: US07990760B2Publication Date: 2011-08-02
- Inventor: Guo Fukano
- Applicant: Guo Fukano
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-151710 20070607
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A semiconductor memory device comprises a cell array having a plurality of SRAM cells arranged in a bit line direction and a word line direction orthogonal to said bit line direction in a matrix; and a peripheral circuit arranged adjacent to the cell array in the bit line direction. The cell array includes first P-well regions and first N-well regions shaped in stripes extending in the bit line direction and arranged alternately in the word line direction. The SRAM cell is formed point-symmetrically in the first P-well region and the first N-well regions located on both sides thereof. The peripheral circuit includes second P-well regions and second N-well regions extending in the bit line direction and arranged alternately in the word line direction.
Public/Granted literature
- US20080304313A1 SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2008-12-11
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