Invention Grant
- Patent Title: Semiconductor memory device and method for manufacturing same
- Patent Title (中): 半导体存储器件及其制造方法
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Application No.: US12211501Application Date: 2008-09-16
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Publication No.: US07990756B2Publication Date: 2011-08-02
- Inventor: Ryoichi Nakamura
- Applicant: Ryoichi Nakamura
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: SNR Denton US LLP
- Priority: JP2007-249791 20070926
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
Disclosed herein is a semiconductor memory device including a plurality of memory cells including first and second inverters each having first and second driver transistors and first and second load transistors and including first and second memory node, and first and second transfer transistors. The of the first and second transfer transistors is connected to each of the first and memory nodes respectively. The memory cell is connected to a bit line and complementary bit line via the first and second transfer transistors respectively wherein a supply voltage applied to the bit line and the complementary bit line is lower than a supply voltage applied to the load transistors, and at least a memory-node-side end of a gate insulating film of the first driver transistor, second driver transistor, first load transistor, and the second load transistor have a thickness larger than a thickness of a gate insulating film of the other part.
Public/Granted literature
- US20090080236A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2009-03-26
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