Invention Grant
- Patent Title: Surface state detecting apparatus
- Patent Title (中): 表面状态检测装置
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Application No.: US12659304Application Date: 2010-03-03
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Publication No.: US07990535B2Publication Date: 2011-08-02
- Inventor: Kazuhiko Fukazawa , Takeo Oomori
- Applicant: Kazuhiko Fukazawa , Takeo Oomori
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-131120 20060510
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
A surface inspection apparatus includes units illuminating repetitive patterns formed on a surface of a suspected substance and measuring a variation in an intensity of regular reflection light caused by a change in shapes of the repetitive patterns, units illuminating the repetitive patterns with linearly polarized light, setting an angle formed between a repetitive direction of the repetitive patterns and a direction of a plane of vibration of the linearly polarized light at a tilt angle, and measuring a variation in a polarized state of the regular reflection light caused by the change in the shapes of the repetitive patterns, and a unit detecting a defect of the repetitive patterns based on the variation in the intensity and the variation in the polarized state of the regular reflection light.
Public/Granted literature
- US20100182593A1 Surface state detecting apparatus Public/Granted day:2010-07-22
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