Invention Grant
- Patent Title: Microlithography illumination systems, components and methods
- Patent Title (中): 微光刻照明系统，组件和方法
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Application No.: US11957647Application Date: 2007-12-17
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Publication No.: US07990520B2Publication Date: 2011-08-02
- Inventor: Berndt Warm , Guenther Dengel
- Applicant: Berndt Warm , Guenther Dengel
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102006060101 20061218
- Main IPC: G01J1/00
- IPC: G01J1/00 ; G03B27/42 ; G03B27/54 ; G03B27/74
Abstract:
The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.
Public/Granted literature
- US20080212059A1 MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS Public/Granted day:2008-09-04
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