Invention Grant
- Patent Title: Variable reluctance position sensor
- Patent Title (中): 可变磁阻位置传感器
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Application No.: US12852219Application Date: 2010-08-06
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Publication No.: US07990136B2Publication Date: 2011-08-02
- Inventor: Didier Frachon , Pierre Gandel
- Applicant: Didier Frachon , Pierre Gandel
- Applicant Address: FR Besancon
- Assignee: Moving Magent Technologies
- Current Assignee: Moving Magent Technologies
- Current Assignee Address: FR Besancon
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR0212425 20021007
- Main IPC: G01B7/14
- IPC: G01B7/14 ; G01B7/30

Abstract:
A variable reluctance analog position device designed to determine the position variation of a target made from a ferromagnetic material. The device includes at least one magnet, the target and the magnet defining a gap therebetween. A magnetosensitive element detects induction variation produced in the gap by relative movement of the target relative to the magnet. The magnet is magnetized in a direction essentially perpendicular to the front surface of the magnet, which defines one edge of the gap. The magnet includes a cavity open at the front surface thereof and the magnetosensitive element is housed in the cavity. Moreover, the target is provided with a specific geometric configuration determined such that the induction variation according to the position of the target corresponds to a pre-defined function.
Public/Granted literature
- US20110043194A1 VARIABLE RELUCTANCE POSITION SENSOR Public/Granted day:2011-02-24
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