Invention Grant
- Patent Title: High-contrast laser mark on substrate surfaces
- Patent Title (中): 衬底表面上的高对比度激光标记
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Application No.: US12500547Application Date: 2009-07-09
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Publication No.: US07989967B2Publication Date: 2011-08-02
- Inventor: Lee Kim Loon
- Applicant: Lee Kim Loon
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L21/76 ; H01L21/301 ; H01L21/46 ; H01L21/78

Abstract:
As part of a first configured laser operation, a smooth, more reflective marking area is formed at a surface of a substrate (e.g., integral heat spreader, or IHS). In a second configured laser operation, a mark is formed at the surface of the substrate within the marking area. The mark contrasts strongly with the reflective surface of the substrate in the marking area. As a result, the mark may be read with an optoelectronic imaging system with a higher rate of reliability than marks disposed at a substrate surface having a microtopographical profile with greater variation from a nominal surface plane. An IHS with a mark so disposed provides benefits when include as a portion of an integrated circuit package, which in turn provides benefits when included as a portion of an electronic system.
Public/Granted literature
- US20090267226A1 HIGH-CONTRAST LASER MARK ON SUBSTRATE SURFACES Public/Granted day:2009-10-29
Information query
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