Invention Grant
- Patent Title: Methods of manufacturing phase-changeable memory devices including upper and lower electrodes
- Patent Title (中): 制造包括上电极和下电极的相变存储器件的方法
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Application No.: US12777599Application Date: 2010-05-11
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Publication No.: US07989259B2Publication Date: 2011-08-02
- Inventor: Bong-Jin Kuh , Yong-Ho Ha , Ji-Hye Yi
- Applicant: Bong-Jin Kuh , Yong-Ho Ha , Ji-Hye Yi
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2004-0064712 20040817
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
A phase-changeable memory device includes a substrate having a contact region on an upper surface thereof. An insulating interlayer on the substrate has an opening therein, and a lower electrode is formed in the opening. The lower electrode has a nitrided surface portion and is in electrical contact with the contact region of the substrate. A phase-changeable material layer pattern is on the lower electrode, and an upper electrode is on the phase-changeable material layer pattern. The insulating interlayer may have a nitrided surface portion and the phase-changeable material layer may be at least partially on the nitrided surface portion of the insulating interlayer. Methods of forming phase-changeable memory devices are also disclosed.
Public/Granted literature
- US20100221879A1 Methods of Manufacturing Phase-Changeable Memory Devices Public/Granted day:2010-09-02
Information query
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