Invention Grant
US07989154B2 Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof
有权
聚合物或抗蚀剂图案，金属膜图案，金属图案和使用其的塑料模具及其制造方法
- Patent Title: Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof
- Patent Title (中): 聚合物或抗蚀剂图案，金属膜图案，金属图案和使用其的塑料模具及其制造方法
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Application No.: US11911897Application Date: 2006-11-06
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Publication No.: US07989154B2Publication Date: 2011-08-02
- Inventor: Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
- Applicant: Jin-Wan Jeon , Jun-Bo Yoon , Koeng Su Lim
- Applicant Address: KR
- Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee: Korea Advanced Institute of Science and Technology
- Current Assignee Address: KR
- Agency: The Belles Group, P.C.
- Priority: KR10-2005-0105551 20051104
- International Application: PCT/KR2006/004591 WO 20061106
- International Announcement: WO2007/052978 WO 20070510
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process.
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