Invention Grant
US07989056B2 Hydrophobic surface coating with low wetting hysteresis, method for depositing same, microcomponent and use
有权
疏水性表面涂层具有低润湿滞后性,沉积方法,微量元件和使用
- Patent Title: Hydrophobic surface coating with low wetting hysteresis, method for depositing same, microcomponent and use
- Patent Title (中): 疏水性表面涂层具有低润湿滞后性,沉积方法,微量元件和使用
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Application No.: US11922424Application Date: 2005-07-01
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Publication No.: US07989056B2Publication Date: 2011-08-02
- Inventor: Marc Plissonnier , Frédéric Gaillard , Yves Fouillet
- Applicant: Marc Plissonnier , Frédéric Gaillard , Yves Fouillet
- Applicant Address: FR Paris
- Assignee: Commissariat A l'Energie Atomique
- Current Assignee: Commissariat A l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Oliff & Berridge, PLC
- International Application: PCT/FR2005/001694 WO 20050701
- International Announcement: WO2007/003720 WO 20070111
- Main IPC: B01J19/98
- IPC: B01J19/98

Abstract:
A hydrophobic surface coating, preferably obtained by chemical vapor deposition, comprises at least an upper thin layer formed by a compound selected from the group consisting of SiCxOy:H with x comprised between 1.4 and 2 and y comprised between 0.8 and 1.4 and SiCx′Ny′:H with x′ comprised between 1.2 and 1.4 and y′ comprised between 0.6 and 0.8, so as to obtain a free surface with a low wetting hysteresis. Such a hydrophobic surface coating can be arranged on the free surface of a microcomponent comprising at least one substrate provided with, an electrode array and particularly suitable for moving drops of liquid by electrowetting on dielectric.
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