Invention Grant
- Patent Title: Method for purifying an aqueous patassium hydroxide solution having rich silicon impurities
- Patent Title (中): 纯化富含硅杂质的氢氧化钾水溶液的方法
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Application No.: US12314951Application Date: 2008-12-19
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Publication No.: US07988831B2Publication Date: 2011-08-02
- Inventor: Yung Hsiung Hsu , Sage Hsu
- Applicant: Yung Hsiung Hsu , Sage Hsu
- Applicant Address: TW Taipei
- Assignee: Yeou Fa Chemical Co., Ltd.
- Current Assignee: Yeou Fa Chemical Co., Ltd.
- Current Assignee Address: TW Taipei
- Agency: Bacon & Thomas, PLLC
- Priority: TW97130152A 20080807
- Main IPC: B01D11/04
- IPC: B01D11/04 ; C01D1/34 ; C01D3/18 ; C07C29/86

Abstract:
A method for purifying an aqueous potassium hydroxide solution having rich silicon impurities has been disclosed in the invention, which is particularly related to a method that utilizes a low-carbon alcohol (such as ethanol) for extracting said aqueous potassium hydroxide solution, and includes the steps of mixing a low-carbon alcohol with an aqueous potassium hydroxide solution having rich silicon impurities; allowing the resulting mixture therefrom to divide into an aqueous phase layer and a low-carbon alcohol phase layer that contains the aqueous potassium hydroxide solution with reduced silicon impurities, and subjecting the low-carbon alcohol phase layer to a separation process for removing the low-carbon alcohol, thereby resulting in an aqueous potassium hydroxide solution having reduced silicon impurities.
Public/Granted literature
- US20100032281A1 Method for purifying an aqueous patassium hydroxide solution having rich silicon impurities Public/Granted day:2010-02-11
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