Invention Grant
- Patent Title: Method for manufacturing III metal nitride single crystal
- Patent Title (中): III型金属氮化物单晶的制造方法
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Application No.: US12804521Application Date: 2010-07-23
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Publication No.: US07988784B2Publication Date: 2011-08-02
- Inventor: Takayuki Hirao , Katsuhiro Imai , Mikiya Ichimura
- Applicant: Takayuki Hirao , Katsuhiro Imai , Mikiya Ichimura
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2008-013689 20080124
- Main IPC: C30B19/12
- IPC: C30B19/12

Abstract:
It is used a substrate main body 1 having a side face 1b and a pair of main faces 1a and an underlying film 2 of a single crystal of a nitride of a metal belonging to the group III formed at least on one main face of the substrate main body 1. A single crystal 3 of a nitride of a metal belonging to the group III is grown on the main face 1a of the substrate main body 1 by a liquid phase process. The underlying film 2 has a shape of a convex figure in a plan view. A surface 4 without the underlying film thereon surrounds the entire circumference of the underlying film 2. The single crystal 3 of a nitride of a metal belonging to the group III grown on the underlying film 2 is not brought into contact with a single crystal of a nitride of a metal belonging to group III formed on another underlying film.
Public/Granted literature
- US20100307404A1 Method for manufacturing III metal nitride single crystal Public/Granted day:2010-12-09
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